Likhase tse Khethehileng

  • Sulfur Tetrafluoride (SF4)

    Sulfur Tetrafluoride (SF4)

    EINECS NO: 232-013-4
    CAS NO: 7783-60-0
  • Nitrous oxide (N2O)

    Nitrous oxide (N2O)

    Nitrous oxide, eo hape e tsejoang e le khase e tšehang, ke k'hemik'hale e kotsi e nang le foromo ea lik'hemik'hale N2O.Ke khase e se nang ’mala, e monko o monate.N2O ke oxidant e ka tšehetsang mollo tlas'a maemo a itseng, empa e tsitsitse mocheso oa kamore 'me e na le phello e fokolang ea anesthetic., mme e ka tshehisa batho.
  • Carbon Tetrafluoride (CF4)

    Carbon Tetrafluoride (CF4)

    Carbon tetrafluoride, eo hape e tsejoang e le tetrafluoromethane, ke khase e se nang 'mala e mocheso o tloaelehileng le khatello, e sa qhibiliheng metsing.Hajoale khase ea CF4 ke khase e sebelisoang ka ho fetesisa ea plasma indastering ea microelectronics.E boetse e sebelisoa e le khase ea laser, sehatsetsi sa cryogenic, solvent, lubricant, insulating material, le pholiso bakeng sa li-tubes tsa infrared detector.
  • Sulfuryl Fluoride (F2O2S)

    Sulfuryl Fluoride (F2O2S)

    Sulfuryl fluoride SO2F2, khase e chefo, e sebelisoa haholo-holo joalo ka sebolaea-likokoanyana.Hobane sulfuryl fluoride e na le litšoaneleho tsa phallo e matla le ho kenella ka matla, chefo e bolaeang likokoanyana, tekanyo e tlase, masala a tlase, lebelo la ho bolaea likokoanyana, nako e khuts'oane ea ho hasana ha khase, tšebeliso e bonolo mochesong o tlase, ha e na phello ho sekhahla sa ho mela le chefo e tlase. E sebelisoa haholo libakeng tsa polokelo, likepe tsa thepa, meaho, matamo a polokelo, thibelo ea mohloa, joalo-joalo.
  • Silane (SiH4)

    Silane (SiH4)

    Silane SiH4 ke khase e petelitsoeng e se nang 'mala, e chefo ebile e sebetsa haholo mochesong o tloaelehileng le khatello.Silane e sebelisoa haholo kholong ea epitaxial ea silicon, lisebelisoa tse tala bakeng sa polysilicon, silicon oxide, silicon nitride, joalo-joalo, lisele tsa letsatsi, likhoele tsa optical, tlhahiso ea likhalase tse mebala, le ho beha mouoane oa lik'hemik'hale.
  • Octafluorocyclobutane (C4F8)

    Octafluorocyclobutane (C4F8)

    Octafluorocyclobutane C4F8, bohloeki ba khase: 99.999%, hangata e sebelisoa e le lijo tsa aerosol propellant le khase e bohareng.Hangata e sebelisoa ho semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition) process, C4F8 e sebelisoa e le sebaka sa CF4 kapa C2F6, e sebelisoang e le ho hloekisa khase le semiconductor process etching gas.
  • Nitric oxide (NO)

    Nitric oxide (NO)

    Nitric oxide gas ke motsoako oa naetrojene e nang le foromo ea lik'hemik'hale NO.Ke khase e se nang ’mala, e sa nkheng, e chefo e sa qhibiliheng metsing.Nitric oxide e sebetsa haholo ka lik'hemik'hale 'me e kopana le oksijene ho etsa khase e senyang ea nitrogen dioxide (NO₂).
  • Hydrogen Chloride (HCl)

    Hydrogen Chloride (HCl)

    Hydrogen chloride HCL Gas ke khase e se nang 'mala e monko o monate.Tharollo ea eona ea metsi e bitsoa hydrochloric acid, e tsejoang hape e le hydrochloric acid.Hydrogen chloride e sebelisoa haholo ho etsa lidae, linoko, meriana, li-chloride tse fapaneng le li-corrosion inhibitors.
  • Hexafluoropropylene (C3F6)

    Hexafluoropropylene (C3F6)

    Hexafluoropropylene, foromo ea lik'hemik'hale: C3F6, ke khase e se nang 'mala mocheso o tloaelehileng le khatello.E sebelisoa haholo ho lokisa lihlahisoa tse fapaneng tsa lik'hemik'hale tse ntle tse nang le fluorine, li-intermediate tsa meriana, litima-mollo, joalo-joalo, hape e ka sebelisoa ho lokisa lisebelisoa tsa polymer tse nang le fluorine.
  • Ammonia (NH3)

    Ammonia (NH3)

    Liquid ammonia / anhydrous ammonia ke sesebelisoa sa bohlokoa sa lik'hemik'hale se nang le mefuta e mengata ea ts'ebeliso.Ammonia ea metsi e ka sebelisoa e le sehatsetsi.Haholo-holo e sebelisoa ho hlahisa nitric acid, urea le menontsha e meng ea lik'hemik'hale, hape e ka sebelisoa e le thepa e tala bakeng sa meriana le chefo e bolaeang likokoanyana.Ka indasteri ea ts'ireletso, e sebelisoa ho etsa li-propellants bakeng sa lirokete le limisaele.