Likhase tse Khethehileng
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Sulfur Tetrafluoride (SF4)
EINECS NO: 232-013-4
CAS NO: 7783-60-0 -
Nitrous oxide (N2O)
Nitrous oxide, eo hape e tsejoang e le khase e tšehang, ke k'hemik'hale e kotsi e nang le foromo ea lik'hemik'hale N2O. Ke khase e se nang ’mala, e monko o monate. N2O ke oxidant e ka tšehetsang ho tuka tlas'a maemo a itseng, empa e tsitsitse mocheso oa kamore 'me e na le phello e fokolang ea anesthetic. , mme e ka tshehisa batho. -
Carbon Tetrafluoride (CF4)
Carbon tetrafluoride, eo hape e tsejoang e le tetrafluoromethane, ke khase e se nang 'mala e mocheso o tloaelehileng le khatello, e sa qhibiliheng metsing. Hajoale khase ea CF4 ke khase e sebelisoang ka ho fetesisa ea plasma indastering ea microelectronics. E boetse e sebelisoa e le khase ea laser, sehatsetsi sa cryogenic, solvent, lubricant, insulating material, le pholiso bakeng sa li-tubes tsa infrared detector. -
Sulfuryl Fluoride (F2O2S)
Sulfuryl fluoride SO2F2, khase e chefo, e sebelisoa haholo-holo joalo ka sebolaea likokonyana. Hobane sulfuryl fluoride e na le litšoaneleho tsa phallo e matla le ho kenella ka matla, chefo e bolaeang likokoanyana, tekanyo e tlase, masala a tlase, lebelo la ho bolaea likokoanyana, nako e khuts'oane ea ho hasana ha khase, tšebeliso e bonolo mochesong o tlase, ha e na phello ho sekhahla sa ho mela le chefo e tlase. E sebelisoa haholo libakeng tsa polokelo, likepe tsa thepa, meaho, matamo a polokelo, thibelo ea mohloa, joalo-joalo. -
Silane (SiH4)
Silane SiH4 ke khase e petelitsoeng e se nang 'mala, e chefo ebile e sebetsa haholo mochesong o tloaelehileng le khatello. Silane e sebelisoa haholo kholong ea epitaxial ea silicon, lisebelisoa tse tala bakeng sa polysilicon, silicon oxide, silicon nitride, joalo-joalo, lisele tsa letsatsi, likhoele tsa optical, tlhahiso ea likhalase tse mebala le deposition ea mouoane oa lik'hemik'hale. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, bohloeki ba khase: 99.999%, hangata e sebelisoa e le lijo tsa aerosol propellant le khase e bohareng. E atisa ho sebelisoa ka semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition) process, C4F8 e sebelisoa e le sebaka sa CF4 kapa C2F6, e sebelisoang e le ho hloekisa khase le semiconductor process etching gas. -
Nitric oxide (NO)
Nitric oxide gas ke motsoako oa naetrojene e nang le foromo ea lik'hemik'hale NO. Ke khase e se nang ’mala, e sa nkheng, e chefo e sa qhibiliheng metsing. Nitric oxide e sebetsa haholo ka lik'hemik'hale 'me e kopana le oksijene ho etsa khase e senyang ea nitrogen dioxide (NO₂). -
Hydrogen Chloride (HCl)
Hydrogen chloride HCL Gas ke khase e se nang 'mala e monko o monate. Tharollo ea eona ea metsi e bitsoa hydrochloric acid, e tsejoang hape e le hydrochloric acid. Hydrogen chloride e sebelisoa haholo ho etsa lidae, linoko, meriana, li-chloride tse fapaneng le li-corrosion inhibitors. -
Hexafluoropropylene (C3F6)
Hexafluoropropylene, foromo ea lik'hemik'hale: C3F6, ke khase e se nang 'mala mocheso o tloaelehileng le khatello. E sebelisoa haholo ho lokisa lihlahisoa tse fapaneng tsa lik'hemik'hale tse ntle tse nang le fluorine, li-intermediate tsa meriana, litima-mollo, joalo-joalo, hape e ka sebelisoa ho lokisa lisebelisoa tsa polymer tse nang le fluorine. -
Ammonia (NH3)
Liquid ammonia / anhydrous ammonia ke sesebelisoa sa bohlokoa sa lik'hemik'hale se nang le mefuta e mengata ea ts'ebeliso. Ammonia ea metsi e ka sebelisoa e le sehatsetsi. Haholo-holo e sebelisoa ho hlahisa nitric acid, urea le menontsha e meng ea lik'hemik'hale, hape e ka sebelisoa e le thepa e tala bakeng sa meriana le chefo e bolaeang likokoanyana. Ka indasteri ea ts'ireletso, e sebelisoa ho etsa li-propellants bakeng sa lirokete le limisaele.
