Likhase tse Ikhethang
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Sebabole Tetrafluoride (SF4)
NOMORO EA EINECS: 232-013-4
NOMORO EA CAS: 7783-60-0 -
Okside ea Nitrous (N2O)
Nitrous oxide, e tsejoang hape e le khase e tšehang, ke k'hemik'hale e kotsi e nang le foromo ea lik'hemik'hale ea N2O. Ke khase e se nang 'mala, e nkhang hamonate. N2O ke oxidant e ka tšehetsang ho cha tlas'a maemo a itseng, empa e tsitsitse mochesong oa kamore 'me e na le phello e nyane ea anesthetic. , 'me e ka etsa hore batho ba tšehe. -
Tetrafluoride ea Khabone (CF4)
Khabone tetrafluoride, e tsejoang hape e le tetrafluoromethane, ke khase e se nang 'mala mochesong o tloaelehileng le khatellong, e sa qhibiliheng ka metsing. Khase ea CF4 hajoale ke khase e sebelisoang haholo ea ho hlaba plasma indastering ea microelectronics. E boetse e sebelisoa e le khase ea laser, sehatsetsing sa cryogenic, solvent, lubricant, thepa ea ho thibela mocheso, le coolant bakeng sa lipeipi tsa infrared detector. -
Sulfuryl Fluoride (F2O2S)
Sulfuryl fluoride SO2F2, khase e chefo, e sebelisoa haholo-holo e le chefo e bolaeang likokoanyana. Hobane sulfuryl fluoride e na le litšobotsi tsa ho hasana le ho kenella ha matla, chefo e bolaeang likokoanyana e pharaletseng, tekanyo e tlase, palo e tlase ea masala, lebelo le potlakileng la ho bolaea likokoanyana, nako e khuts'oane ea ho hasana ha khase, tšebeliso e bonolo mochesong o tlase, ha e na phello sekhahla sa ho mela le chefo e tlase, e sebelisoa haholo matlong a polokelo ea lintho tse phelang, likepeng tsa thepa, mehahong, matamong a matamo, thibelo ea bohloa, jj. -
Silane (SiH4)
Silane SiH4 ke khase e hatelletsoeng e se nang 'mala, e chefo le e sebetsang haholo mochesong le khatellong e tloaelehileng. Silane e sebelisoa haholo kholong ea epitaxial ea silicon, thepa e tala bakeng sa polysilicon, silicon oxide, silicon nitride, jj., lisele tsa letsatsi, likhoele tsa optical, tlhahiso ea khalase e mebala, le ho kenngoa ha mouoane ka lik'hemik'hale. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, bohloeki ba khase: 99.999%, hangata e sebelisoa e le propellant ea aerosol ea lijo le khase e mahareng. Hangata e sebelisoa ts'ebetsong ea semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition), C4F8 e sebelisoa e le sebaka sa CF4 kapa C2F6, e sebelisoa e le khase ea ho hloekisa khase le khase ea ho qoelisa tsamaiso ea semiconductor. -
Nitric Oxide (NO)
Khase ea nitric oxide ke motsoako oa naetrojene o nang le foromo ea lik'hemik'hale ea NO. Ke khase e se nang 'mala, e se nang monko, e chefo e sa qhibiliheng metsing. Nitric oxide e arabela haholo ka lik'hemik'hale 'me e arabela le oksijene ho etsa khase e senyang ea nitrogen dioxide (NO₂). -
Hydrogen Chloride (HCl)
Hydrogen chloride HCL Gas ke khase e se nang 'mala e nang le monko o bohale. Tharollo ea eona ea metsi e bitsoa hydrochloric acid, e tsejoang hape e le hydrochloric acid. Hydrogen chloride e sebelisoa haholo ho etsa dae, linoko, meriana, li-chloride tse fapaneng le li-inhibitor tsa mafome. -
Hexafluoropropylene (C3F6)
Hexafluoropropylene, mokhoa oa lik'hemik'hale: C3F6, ke khase e se nang 'mala mochesong o tloaelehileng le khatellong. E sebelisoa haholo-holo ho lokisa lihlahisoa tse fapaneng tsa lik'hemik'hale tse nang le fluorine, metsoako ea meriana, lintho tse timang mollo, jj., 'me e ka boela ea sebelisoa ho lokisa thepa ea polymer e nang le fluorine. -
Ammonia (NH3)
Ammonia e metsi / ammonia e sa keneleng metsi ke thepa ea bohlokoa ea lik'hemik'hale e nang le mefuta e mengata ea ts'ebeliso. Ammonia e metsi e ka sebelisoa e le sehatsetsi. E sebelisoa haholo ho hlahisa nitric acid, urea le manyolo a mang a lik'hemik'hale, 'me e ka boela ea sebelisoa e le thepa e tala bakeng sa meriana le chefo e bolaeang likokoanyana. Indastering ea tšireletso, e sebelisoa ho etsa li-propellant bakeng sa lirokete le limisaele.
