Theknoloji ea etching e omileng ke e 'ngoe ea mekhoa ea bohlokoa. Khase e omileng ea etching ke sesebelisoa sa bohlokoa tlhahisong ea li-semiconductor le mohloli oa bohlokoa oa khase bakeng sa etching ea plasma. Ts'ebetso ea eona e ama ka kotloloho boleng le ts'ebetso ea sehlahisoa sa ho qetela. Sengoliloeng sena se arolelana haholo-holo hore na ke likhase life tse sebelisoang hangata ts'ebetsong e omileng ea etching.
Likhase tse thehiloeng ho fluorine: joalo kacarbon tetrafluoride (CF4), hexafluoroethane (C2F6), trifluoromethane (CHF3) le perfluoropropane (C3F8). Likhase tsena li ka hlahisa li-fluoride tse sa tsitsang ha li kopanya silicon le metsoako ea silicon, ka tsela eo li fihlela ho tlosoa ha thepa.
Likhase tse thehiloeng ho chlorine: joalo ka chlorine (Cl2),boron trichloride (BCl3)le silicon tetrachloride (SiCl4). Likhase tse thehiloeng ho chlorine li ka fana ka li-ion tsa chloride nakong ea ts'ebetso ea etching, e thusang ho ntlafatsa sekhahla sa etching le khetho.
Ligase tse thehiloeng ho bromine: joalo ka bromine (Br2) le bromine iodide (IBr). Likhase tse thehiloeng ho bromine li ka fana ka ts'ebetso e betere ea ho ts'oara lits'ebetsong tse itseng tsa etching, haholo-holo ha u kenya lisebelisoa tse thata joalo ka silicon carbide.
Likhase tse thehiloeng ho naetrojene le tsa oksijene: tse kang nitrogen trifluoride (NF3) le oxygen (O2). Likhase tsena hangata li sebelisoa ho lokisa maemo a karabelo ts'ebetsong ea etching ho ntlafatsa khetho le tataiso ea etching.
Likhase tsena li fihlella ho ts'oaroa ka nepo ha bokaholimo ba lintho ka ho kopanya ho phatloha ha 'mele le karabelo ea lik'hemik'hale nakong ea etching ea plasma. Khetho ea khase ea etching e ipapisitse le mofuta oa thepa e lokelang ho hlophisoa, litlhoko tsa khetho ea etching, le sekhahla se lakatsehang sa etching.
Nako ea poso: Feb-08-2025
