Indasteri ea naha ea rona ea semiconductor le indasteri ea liphanele li boloka boemo bo holimo ba nala. Nitrogen trifluoride, joalo ka khase e khethehileng ea elektronike e bohlokoahali le e kholo ka ho fetisisa tlhahiso le ts'ebetsong ea liphanele le li-semiconductors, e na le sebaka se pharaletseng sa mmaraka.
Likhase tse khethehileng tsa elektroniki tse nang le fluorine li kenyelletsasulfur hexafluoride (SF6)tungsten hexafluoride (WF6),carbon tetrafluoride (CF4), trifluoromethane (CHF3), nitrogen trifluoride (NF3), hexafluoroethane (C2F6) le octafluoropropane (C3F8). Nitrogen trifluoride (NF3) e sebelisoa haholo-holo e le mohloli oa fluorine bakeng sa hydrogen fluoride-fluoride gas high-energy chemical lasers. Karolo e sebetsang (hoo e ka bang 25%) ea matla a karabelo pakeng tsa H2-O2 le F2 e ka lokolloa ka mahlaseli a laser, kahoo li-lasers tsa HF-OF ke li-lasers tse tšepisang ka ho fetisisa har'a li-laser tsa lik'hemik'hale.
Nitrogen trifluoride ke khase e ntle ka ho fetesisa ea plasma indastering ea microelectronics. Bakeng sa etching silicon le silicon nitride, nitrogen trifluoride e na le sekhahla se phahameng sa etching le khetho ho feta carbon tetrafluoride le motsoako oa carbon tetrafluoride le oksijene, 'me ha e na tšilafalo holimo. Haholo-holo ho etching ea lisebelisoa tsa potoloho tse kopantsoeng tse nang le botenya bo ka tlase ho 1.5um, trifluoride ea naetrojene e na le sekhahla se setle haholo sa etching le selectivity, e sieang ho se na masala holim'a ntho e entsoeng, hape ke ntho e ntle haholo ea ho hloekisa. Ka nts'etsopele ea nanotechnology le nts'etsopele e kholo ea indasteri ea lisebelisoa tsa elektroniki, tlhoko ea eona e tla eketseha letsatsi le letsatsi.
Joalo ka mofuta oa khase e khethehileng e nang le fluorine, nitrogen trifluoride (NF3) ke sehlahisoa se seholo ka ho fetisisa sa khase e khethehileng ea elektroniki 'marakeng. Ha e na lik'hemik'hale mochesong oa kamore, e sebetsa ho feta oksijene, e tsitsitse ho feta fluorine, 'me e bonolo ho sebetsana le mocheso o phahameng.
Nitrogen trifluoride e sebelisoa haholo joalo ka plasma etching gase le mochini o hloekisang kamore ea karabelo, e loketseng masimo a ho etsa joalo ka li-chips tsa semiconductor, li-flat panel displays, optical fibers, photovoltaic cell, jj.
Ha e bapisoa le likhase tse ling tsa elektronike tse nang le fluorine, nitrogen trifluoride e na le melemo ea ho itšoara ka potlako le ho sebetsa hantle haholo, haholo-holo ha ho kenngoa lisebelisoa tse nang le silicon tse kang silicon nitride, e na le sekhahla se phahameng sa ho senya le ho khetha, ho siea ho se na masala holim'a ntho e kentsoeng, hape ke ntho e ntle haholo ea ho hloekisa, 'me e ke ke ea e-ba le ts'ebetso e sa silafalitsoeng.
Nako ea poso: Dec-26-2024
