Epitaxial (kholo)Motsoako Gas

Indasteri ea semiconductor, khase e sebelisoang ho holisa karolo e le 'ngoe kapa ho feta ea lintho tse bonahalang ka ho beha mouoane oa lik'hemik'hale holim'a substrate e khethiloeng ka hloko e bitsoa epitaxial gas.

Likhase tsa silicon epitaxial tse sebelisoang ka tloaelo li kenyelletsa dichlorosilane, silicon tetrachloride lesilane. Haholo-holo e sebelisoa bakeng sa epitaxial silicon deposition, silicon oxide film deposition, silicon nitride film deposition, amorphous silicon film deposition for solar cell and other photoreceptors, joalo-joalo Epitaxy ke mokhoa oo ho oona ho kenngoa lesela le le leng la kristale le ho hōla holim'a substrate.

Kemiso ea Mouoane oa Lik'hemik'hale (CVD) Motsoako oa Khase

CVD ke mokhoa oa ho kenya likarolo tse itseng le metsoako ka lik'hemik'hale tsa khase ea khase ho sebelisa metsoako e sa tsitsang, ke hore, mokhoa oa ho etsa filimi o sebelisang lik'hemik'hale tsa khase ea khase. Ho itšetlehile ka mofuta oa filimi e entsoeng, khase ea mouoane oa lik'hemik'hale (CVD) e sebelisoang le eona e fapane.

DopingMotsoako oa Khase

Ha ho etsoa lisebelisoa tsa semiconductor le lipotoloho tse kopantsoeng, litšila tse itseng li kenngoa ka har'a lisebelisoa tsa semiconductor ho fana ka lisebelisoa tsa mofuta o hlokahalang oa conductivity le ho hanyetsa ho itseng ho etsa li-resistors, li-junctions tsa PN, lihlopha tse patiloeng, joalo-joalo Khase e sebelisoang ts'ebetsong ea doping e bitsoa doping gas.

Haholo-holo e kenyelletsa arsine, phosphine, phosphorus trifluoride, phosphorus pentafluoride, arsenic trifluoride, arsenic pentafluoride,boron trifluoride, diborane, joalo-joalo.

Hangata, mohloli oa doping o kopantsoe le khase e tsamaisang thepa (e kang argon le nitrogen) ka har'a khabinete ea mohloli. Ka mor'a ho kopanya, phallo ea khase e tsoela pele ho kenngoa ka sebōping sa phallo 'me e pota-potile sephaphatha, e beha li-dopants holim'a sekoti, ebe e sebetsana le silicon ho hlahisa litšepe tse nang le doped tse fallelang ka silicon.

EtchingMotsoako oa Khase

Etching ke ho tlosa sebaka sa ts'ebetso (joalo ka filimi ea tšepe, filimi ea silicon oxide, joalo-joalo) holim'a substrate ntle le masking ea photoresist, ha u ntse u boloka sebaka seo ka masking ea photoresist, e le ho fumana mokhoa o hlokahalang oa ho nka litšoantšo holim'a substrate.

Mekhoa ea ho cheka e kenyelletsa etching ea lik'hemik'hale tse metsi le etching ea lik'hemik'hale tse omeletseng. Khase e sebelisoang ho etching ea lik'hemik'hale e ommeng e bitsoa etching gas.

Khase ea etching hangata ke khase ea fluoride (halide), joalo kacarbon tetrafluoride, nitrogen trifluoride, trifluoromethane, hexafluoroethane, perfluoropropane, joalo-joalo.