Epitaxial (kholo)Motsoako oa Gas
Indastering ea semiconductor, khase e sebelisoang ho holisa lera le le leng kapa a mangata a thepa ka ho beha mouoane oa lik'hemik'hale holim'a substrate e khethiloeng ka hloko e bitsoa khase ea epitaxial.
Likhase tse sebelisoang haholo tsa silicon epitaxial li kenyelletsa dichlorosilane, silicon tetrachloride lesilane. E sebediswa haholo-holo bakeng sa ho bewa ha silicon epitaxial, ho bewa ha filimi ya silicon oxide, ho bewa ha filimi ya silicon nitride, ho bewa ha filimi ya silicon e sa fetoheng bakeng sa disele tsa letsatsi le di-photoreceptor tse ding, jj. Epitaxy ke tshebetso eo ho yona thepa e le nngwe ya kristale e bewang le ho hodiswa hodima substrate.
Khase e Tsoakiloeng ea Khemik'hale ea ho Tlosoa ha Mouoane (CVD)
CVD ke mokhoa oa ho beha likarolo le metsoako e itseng ka liketso tsa lik'hemik'hale tsa mohato oa khase ho sebelisoa metsoako e feto-fetohang, ke hore, mokhoa oa ho etsa filimi o sebelisang liketso tsa lik'hemik'hale tsa mohato oa khase. Ho latela mofuta oa filimi e entsoeng, khase ea chemical vapor deposition (CVD) e sebelisoang le eona e fapane.
Ho sebelisa lithethefatsiKhase e Tsoakiloeng
Ha ho etsoa disebediswa tsa semiconductor le dipotoloho tse kopaneng, ditshila tse itseng di kenngwa ka hara disebediswa tsa semiconductor ho fa disebediswa mofuta o hlokahalang wa ho tsamaisa motlakase le ho hanyetsa ho itseng ho etsa di-resistor, di-PN junctions, dikarolo tse patilweng, jj. Khase e sebediswang tshebetsong ya ho sebedisa di-doping e bitswa khase ya ho sebedisa di-doping.
Haholo-holo e kenyeletsa arsine, phosphine, phosphorus trifluoride, phosphorus pentafluoride, arsenic trifluoride, arsenic pentafluoride,boron trifluoride, diborane, jj.
Hangata, mohlodi wa doping o kopanngwa le kgase e tsamaisang (jwalo ka argon le naetrojene) ka hara khabinete ya mohlodi. Kamora ho kopanya, phallo ya kgase e kenngwa ka ho tswela pele ka hara sebopi sa ho hasana mme e potoloha wafer, e behe di-dopants hodima wafer, ebe e arabela le silicon ho hlahisa ditshipi tse nang le doped tse fallelang ho silicon.
Ho hlabaMotsoako oa Khase
Ho fata ke ho fata bokaholimo ba ts'ebetso (joalo ka filimi ea tšepe, filimi ea silicon oxide, jj.) holim'a substrate ntle le ho pata photoresist, ha ka nako e ts'oanang ho boloka sebaka ka photoresist masking, e le ho fumana mokhoa o hlokahalang oa ho nka litšoantšo holim'a substrate.
Mekhoa ea ho hlaba e kenyelletsa ho hlaba ka lik'hemik'hale tse metsi le ho hlaba ka lik'hemik'hale tse omileng. Khase e sebelisoang ho hlaba ka lik'hemik'hale tse omileng e bitsoa khase ea ho hlaba.
Khase e tjhesang hangata ke khase ea fluoride (halide), joalo katetrafluoride ea khabone, naetrojene trifluoride, trifluoromethane, hexafluoroethane, perfluoropropane, jj.
Nako ea poso: Pulungoana-22-2024





